Journal de la nanomédecine et de la découverte biothérapeutique
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Abstrait

Sol-gel based surface patterning

David Riassetto, Celine Ternon and Michel Langle

Photolithography is a well-known and often used technique. However, this technique is mainly used for bulk material or native oxide etching and usually requires an etching step with a strong acid or base. Due to these reasons, photolithography is not well compatible with sensitive substrates like glass or plastic ones. Based on sol???gel route, we formulated and optimized different all-inorganic oxides photo-resists. These photo-resists lead to single-step lithography (i.e. with only one deposition step) of nanometer-scale thin oxides films, etched with solvent or diluted acid. Such method is compatible with the formation of gratings in the range of the millimeter to the sub-micrometric size on rather large surfaces on top of glass or plastic substrates. Our photoresists where made by integrating a photosensitive chelating compound to a ???classical??? sol-gel oxide sol. These photoresists may be deposited by spincoating on various substrates, then insolated through a mask and selectively washed/ etched. On one hand, TiO2 photo-resist was investigated for the functionalization of surfaces with a spatial wettability contrast. On the other hand, ZnO photo-resist was studied for the localized growth of ZnO nanowires. The synthesis principle will be introduced at the conference. The physicochemical and morphological properties of the obtained surfaces, linked to the process parameters, will be presented. Moreover, potential applications will be shown